Advanced Thin Film and Laser Processing Laboratory

Cook Hall, 1062
Laboratory Director: R.P.H. Chang, MSE

This laboratory has equipment which supports the synthesis and processing of thin film systems ranging from ultra thin films to multi-layers and superlattices. Both physical deposition systems, such as sputtering and electron beam equipment, as well as chemical vapor deposition systems, such as metalorganic chemical vapor deposition equipment, are available. The laboratory also provides a means of forming metastable materials with a laser, and is equipped with a scanning ellipsometer which can be used from IR through the visible range. Software is available to perform simulation on multi-layer structures.

1. Thermal Vacuum Evaporator: Diffusion pumped (base pressure 5 x 10 -7 ) Glass Bell Jar and guard

2. Two Pulsed Organometallic Chemical Vapor Deposition Systems: Each system can handle up to eight solid or liquid sources for deposition. All the source materials are fed into the main chamber via computer controlled valves. Microwave power is available to sustain a gas discharge at 10 -3 torr. Thus complex oxides and nitrides can be made by this machine with precise stoichiometry. In addition, superlattice film of oxides can be synthesized. These systems are the only ones of its kind in the world.

3. SOPRA Scanning Ellipsometry System: This spectroscopic ellipsometer with an automated computer control allows samples of thin film to be measured and mapped with high precision for the dielectric function as well as the layer thickness. The ellipsometer covers an optical range from near IR to visible. Computer software is available for simulating film composition, multilayered structures, as well as surface roughness.

4. Laser ablation: This system is used for thin film processing.